LRCX - Lam Research Corporation

NasdaqGS - NasdaqGS Prix différé. Devise en USD

Lam Research Corporation

4650 Cushing Parkway
Fremont, CA 94538
United States
510-572-0200
http://www.lamresearch.com

SecteurTechnology
Secteur d’activitéSemiconductor Equipment & Materials
Employés à temps plein9 800

Dirigeants clés

NomTitrePayerExercéÂge
Mr. Martin B. AnsticePres, CEO & Director3,38MS.O.50
Mr. Douglas R. BettingerExec. VP, CFO & Chief Accounting Officer1,43MS.O.50
Mr. Timothy M. ArcherExec. VP & COO1,82M7,27M50
Dr. Richard A. GottschoExec. VP & Corp. CTO1,41M4,3M65
Ms. Sarah A. O??Dowd Esq.Sr. VP, Chief Legal Officer & Sec.1,06MS.O.67
Les montants ont été établis en date du 31 décembre 2017 et les valeurs de compensation concernent le dernier exercice fiscal clos à cette date. Le terme « rémunération » désigne le salaire, les bonus, etc. Le terme « exercé » est utilisé pour la valeur des options exercées au cours de l’exercice fiscal. Devise exprimée en USD.

Description

Lam Research Corporation designs, manufactures, markets, refurbishes, and services semiconductor processing equipment used in the fabrication of integrated circuits worldwide. The company offers thin film deposition products, including SABRE electrochemical deposition products for copper damascene manufacturing; ALTUS systems to deposit conformal atomic layer films for tungsten metallization applications; VECTOR plasma-enhanced chemical vapor deposition (CVD) and atomic layer deposition systems to deposit oxides, nitrides, and carbides for hardmasks, multiple patterning films, anti-reflective layers, multi-layer stack films, and diffusion barriers; and Striker atomic layer deposition systems that deliver conformal dielectric films for spacer-based patterning and liner applications in various advanced memory and logic structures. Its thin film deposition products also comprise SPEED high-density plasma CVD products for applications in shallow trench isolation, pre-metal dielectrics, inter-layer dielectrics, inter-metal dielectrics, and passivation layers; and SOLA ultraviolet thermal processing products for treatment of back-end-of-line (BEOL) low-k dielectric films and front-end-of-line silicon nitride strained films. In addition, the company offers plasma etch products, such as Kiyo that provide solutions for conductor etch applications; Versys metal products, which offer a platform for BEOL metal etch processes; Flex for dielectric etch applications; and Syndion to address various through-silicon via etch and complementary image sensor etch applications. Further, it provides single-wafer clean products comprising EOS, Da Vinci, DV-Prime, and SP series products for wet etch and clean applications in wafer-level packaging; and Coronus plasma-based bevel clean products to enhance die yield by removing particles, residues, and unwanted films from the wafer’s edge, as well as legacy products. The company was founded in 1980 and is headquartered in Fremont, California.

Gouvernance d’entreprise

L’ISS Governance QualityScore de Lam Research Corporation en date du 1 décembre 2017 est 1. Les scores principaux sont Audit : 1; Société : 4; Droits des actionnaires : 2; Compensation : 2.

Résultats de gouvernance d’entreprise offerts par Institutional Shareholder Services (ISS). Les résultats indiquent un rang décile par rapport à l’indice ou à la région. Un résultat décile de 1 indique un risque de gouvernance faible, tandis que 10 indique un risque de gouvernance élevé.
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